We have researched and developed the vacuum plasma cleaner for 12 years. GD-10 RF vacuum plasma cleaning machine uses radio frequency, and the processing effect is better in a vacuum environment.
| Item | Parameter |
|---|---|
| Input Voltage | AC220 V (±10V) |
| Output Power | 0-300 W |
| Frequency | 13.56 MHz |
| Capacity | 10L |
| Cavity Size | 250(L)*200(W)*200(H) mm |
| Size(L*W*H) | 600*560*520mm |
| Cavity Material | 316 stainless steel / aluminum alloy |
| Gas Used | Two-way Process Gas Configuration (Available Gas: Ar, O2,N2, Air) |
Plasma cleaning the chip for improve surface wettability and cleanliness
13.56 MHz high power plasma cleaning for semiconductor
Best treatment result for cleaning the organic pollutants of electronic component
| Standard Package | Wooden case package and pallet |
| Delivery Time | 10 working days |
Fari was founded in 2011, is a professional manufacturing enterprise specializing in the research and development, production, sales and promotion of vacuum plasma cleaner and atmospheric plasma surface treatment technology equipment.